China is closing in on U.S. technology lead, AI researchers say

At a Beijing conference, Chinese AI researchers said growing risk-taking and innovation could help narrow the technological gap with the United States, but a shortage of advanced chipmaking equipment and software ecosystem weaknesses remain major constraints; a prototype extreme-ultraviolet lithography machine exists but has not yet produced working chips and may not do so until 2030.

Chinese AI researchers speaking at a conference in Beijing said the country can narrow its technological gap with the United States through greater risk-taking and innovation. They noted domestic strengths such as electricity and infrastructure, but also pointed to key constraints that limit progress. The comments came as several Chinese AI startups made notable debuts on the Hong Kong stock exchange, reflecting rising confidence in the sector. What was reported: - Researchers identified production capacity, including lithography machines, and the software ecosystem as the main technical bottlenecks to closing the gap with the U.S. - Reuters reported that China has completed a working prototype of an extreme-ultraviolet (EUV) lithography machine, but it has not produced working chips and may not do so until 2030. - Speakers at the summit also noted that U.S. computing infrastructure and investment remain substantially larger, while Chinese firms are pursuing algorithm–hardware co-design and younger entrepreneurs are taking more risks. Summary: The remarks indicate measured advances in Chinese AI research and entrepreneurship alongside persistent hardware and investment shortfalls. The timeline for producing cutting-edge chips domestically remains uncertain, with a possible milestone mentioned around 2030.